AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made
Aluminium-Tantalum
Zolingazo zimakonzedwa pophatikiza Aluminiyamu ndi Tantalum ufa kapena kusungunuka kwa vacuum ndikutsatiridwa mpaka kukanika kwathunthu.Zinthu zophatikizikazi zimasinthidwa mwachisawawa ndipo zimapangidwa kukhala mawonekedwe omwe mukufuna.
Aluminium Tantalum sputtering chandamale ali ndi kuyera kwambiri, homogeneous microstructure komanso madutsidwe abwino kwambiri.Amagwiritsidwa ntchito kwambiri popanga mafilimu owonda kwambiri pamakampani owonetsa gulu lathyathyathya.Aluminiyamu Tantalum ikhoza kuwonjezeredwa kuti ipange mawonekedwe apamwamba a Titanium alloy kuti ipititse patsogolo kutentha kwake.
Zoyipa za Al-Ta alloy
| kupanga | Zamkatimu(%） | ||||
| Ta | Fe | Si | C | O | |
| AlTa60 | 55.0 ~ 65.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
| AlTa70 | 65.0-75.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Aluminium Tantalum Sputtering Equipment malinga ndi zomwe Makasitomala afuna.Zogulitsa zathu zimakhala ndi makina abwino kwambiri, mawonekedwe osakanikirana, opukutidwa popanda tsankho, pores kapena ming'alu.Kuti mudziwe zambiri, chonde titumizireni.
