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CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Coating

Cobalt Chromium Tantalum

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

CoCrTa

Kupanga

Cobalt Chromium Tantalum

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤200mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Cobalt Chromium Tantalum sputtering chandamale amapangidwa ndi kuponyera ndi vacuum kusungunuka.ndipo kenako amapangidwa kukhala mawonekedwe omwe akufuna.Iwo ali mkulu chiyero ndi homogenous microstructure.Co-Cr-Ta inali chinthu chofunikira kwambiri chojambulira maginito chifukwa cha maginito ake: kukakamiza kwambiri, phokoso lotsika komanso masikweya abwino kwambiri.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Cobalt Chromium Tantalum Sputtering Materials malinga ndi makonda a Makasitomala.Kuti mudziwe zambiri, chonde titumizireni.


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