CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made
Chromium Aluminium
Kupanga kwa Chromium Aluminium Sputtering Target kumaphatikizapo izi:
1. Pogaya ufa ndi kusakaniza.
2. Hot isostatic kukanikiza mankhwala kupeza theka-amamaliza mankhwala.
3. Kukonza chandamale cha chromium aluminium alloy sputtering chandamale kuti apeze chromium aluminium alloy sputtering chandamale.
Panthawi yoyika zolinga za CrAl sputtering, zokutira zolimba za Aluminium-Chrom-Nitrid (AlCrN) zimapangidwa.Chophimba ichi chikuwonetsa kuuma kwakukulu komanso kukana kwa okosijeni ngakhale kutentha kwambiri.Odula amatha kuthamanga pazakudya zambiri kuti awonjezere zokolola ndikukweza bwino akamagwiritsa ntchito makina a CNC.
Zolinga zathu za AlCr ndi katundu wawo
Cr-70Alpa% | Cr-60Alpa% | Cr-50Alpa% | |
Chiyero (%) | 99.8/99.9/99.95 | 99.8/99.9/99.95 | 99.8/99.9/99.95 |
Kuchulukana(g/cm3) | 3.7 | 4.35 | 4.55 |
Gmvula Kukula(µm) | 100/50 | 100/50 | 100/50 |
Njira | HIP | HIP | HIP |
Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Aluminium Chromium Sputtering Materials molingana ndi makonda a Makasitomala.Zogulitsa zathu zimakhala ndi makina abwino kwambiri, mawonekedwe osakanikirana, opukutidwa popanda tsankho, pores kapena ming'alu.Kuti mudziwe zambiri, chonde titumizireni.