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MoCu Sputtering Target High Purity Thin Film Pvd Coating Mwambo Wopangidwa

Molybdenum Copper

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

MoCu

Kupanga

Molybdenum Copper

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

PM

Kukula komwe kulipo

L≤200mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Cholinga cha Molybdenum Copper sputtering chimapangidwa pogwiritsa ntchito sintering infiltration: Molybdenum powders sintered ndi kupanga theka-malizidwa mankhwala, pamodzi ndi microwave-assisted amadzimadzi njira njira.Molybdenum Copper alloy ili ndi mawonekedwe owoneka bwino akuthupi komanso amakina: kukhathamiritsa kwamagetsi ndi matenthedwe, kutsika komanso kusinthika kokwanira pakukulitsa matenthedwe, kukana kuvala, komanso kutentha kwambiri.

Zolemba (%)

Cu

Mo

Chidetso (%)

MoCu10

10±2

Kusamala

≤0.1

MoCu15

15 ±3

Kusamala

≤0.1

MoCu20

20±3

Kusamala

≤0.1

MoCu25

25 ±3

Kusamala

≤0.1

MoCu40

40 ±5

Kusamala

≤0.1

Rich Special Materials amagwira ntchito pa Manufacture of Sputtering Target ndipo amatha kupanga Molybdenum Copper Sputtering Equipment malinga ndi zomwe Makasitomala afuna.Kuti mudziwe zambiri, chonde titumizireni.


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