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Tungsten Silicide

Tungsten Silicide

Kufotokozera Kwachidule:

Gulu Cnthawimic Sputtering Target
Chemical Formula WSI2
Kupanga Tungsten Silicide
Chiyero 99.9%,99.95%,99.99%
Maonekedwe Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda
PRoduction Process PM
Kukula komwe kulipo L200mm, W200 mm

Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Tungsten silicide WSi2 imagwiritsidwa ntchito ngati chinthu chogwedeza magetsi mu ma microelectronics, kutsekeka pa mawaya a polysilicon, zokutira zotsutsa-oxidation ndi zokutira waya.Silicide ya Tungsten imagwiritsidwa ntchito ngati cholumikizira mu ma microelectronics, okhala ndi resistivity ya 60-80μΩcm.Amapangidwa pa 1000 ° C.Nthawi zambiri amagwiritsidwa ntchito ngati shunt kwa mizere ya polysilicon kuti awonjezere kuwongolera kwake ndikuwonjezera liwiro la chizindikiro.Tungsten Silicide wosanjikiza imatha kukonzedwa ndi kuyika kwa nthunzi wamankhwala, monga kuyika kwa nthunzi.Gwiritsani ntchito monosilane kapena dichlorosilane ndi tungsten hexafluoride ngati mpweya wamafuta.Filimu yoyikidwayi si ya stoichiometric ndipo imafuna annealing kuti isinthe kukhala mawonekedwe a stoichiometric.

Silicide ya Tungsten imatha kusintha filimu yakale ya tungsten.Tungsten silicide imagwiritsidwanso ntchito ngati chotchinga pakati pa silicon ndi zitsulo zina.

Silicide ya Tungsten ndiyofunikanso kwambiri m'makina a microelectromechanical, omwe ma tungsten silicide amagwiritsidwa ntchito makamaka ngati filimu yopyapyala yopanga ma microcircuits.Pachifukwa ichi, filimu ya tungsten silicide ikhoza kukhala plasma-etched pogwiritsa ntchito, mwachitsanzo, silicide.

ITEM Chemical zikuchokera
Chinthu W C P Fe S Si
Zomwe zili (wt%) 76.22 0.01 0.001 0.12 0.004 Kusamala

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Tungsten Silicide Sputtering Materials malinga ndi zomwe Makasitomala afuna.Kuti mudziwe zambiri, chonde titumizireni.


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