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Ubwino ndi kuipa kwa teknoloji yopaka sputtering

Posachedwapa, owerenga ambiri anafunsa za ubwino ndi kuipa sputtering ❖ kuyanika luso, Malinga ndi zofuna za makasitomala athu, tsopano akatswiri a RSM Technology Department adzagawana nafe, kuyembekezera kuthetsa mavuto.Mwina pali mfundo zotsatirazi:

https://www.rsmtarget.com/

  1, Kuphulika kwa magnetron kosakwanira

Kungoganiza kuti maginito flux kudutsa mkati ndi kunja maginito pole malekezero a magnetron sputtering cathode si wofanana, ndi wosagwirizana magnetron sputtering cathode.The maginito wamba magnetron sputtering cathode anaikira pafupi chandamale pamwamba, pamene mphamvu ya maginito wa unbalanced magnetron sputtering cathode kunja kwa chandamale.Mphamvu ya maginito ya cathode wamba wa magnetron imalepheretsa kwambiri madzi a m'magazi pafupi ndi malo omwe akuyang'ana, pamene madzi a m'magazi pafupi ndi gawo lapansi ndi ofooka kwambiri, ndipo gawo lapansi silidzagwedezeka ndi ma ion amphamvu ndi ma electron.Maginito osagwirizana ndi maginito a magnetron cathode amatha kutambasula plasma kutali ndi chandamale ndi kumiza gawo lapansi.

  2, Mawayilesi pafupipafupi (RF) sputtering

Mfundo yoyika filimu yotetezera: kuthekera kolakwika kumagwiritsidwa ntchito kwa woyendetsa woyikidwa kumbuyo kwa chandamale cha insulating.M'madzi a m'madzi a m'magazi, pamene mbale yolondolera ya ayoni ifulumizitsa, imawombera chandamale chomwe chili kutsogolo kwake kuti chilavute.Kutulutsa uku kumatha masekondi 10-7 okha.Pambuyo pake, kuthekera kwabwino kopangidwa ndi chiwongolero chabwino chomwe chimasonkhanitsidwa pa chandamale chotsekereza chimathetsa kuthekera koyipa pa mbale ya kondakitala, kotero kuyimitsidwa kwamphamvu kwa ayoni amphamvu kwambiri pazida zoteteza kumayimitsidwa.Panthawiyi, ngati polarity wa magetsi asinthidwa, ma elekitironi adzawombera mbale yotetezera ndikuchepetsa mtengo wabwino pa mbale yotetezera mkati mwa masekondi 10-9, kupanga ziro zake.Panthawi imeneyi, kutembenuza polarity ya magetsi kungapangitse sputtering kwa masekondi 10-7.

Ubwino wa RF sputtering: Zolinga zonse zachitsulo ndi dielectric target zitha kunyalanyazidwa.

  3, DC magnetron sputtering

Zida zokutira za magnetron zimawonjezera mphamvu ya maginito mu DC sputtering cathode chandamale, amagwiritsa ntchito mphamvu ya Lorentz ya maginito kuti amange ndi kukulitsa njira ya ma elekitironi mu gawo la magetsi, kumawonjezera mwayi wa kugunda pakati pa ma elekitironi ndi ma atomu a gasi, kumawonjezera Kuchuluka kwa ma ionization a maatomu a gasi, kumawonjezera kuchuluka kwa ma ion amphamvu kwambiri omwe akuphulitsa chandamale ndikuchepetsa kuchuluka kwa ma elekitironi amphamvu kwambiri omwe akuphulitsa gawo lapansi.

Ubwino wa planar magnetron sputtering:

1. Kuchulukira kwamphamvu kwamphamvu kumatha kufika 12w / cm2;

2. Mphamvu yamagetsi imatha kufika 600V;

3. Kuthamanga kwa gasi kumatha kufika 0.5pa.

Kuipa kwa planar magnetron sputtering: chandamale chimapanga sputtering njira mu msewu wonyamukira ndege, etching a chandamale lonse pamwamba ndi wosagwirizana, ndi mlingo magwiritsidwe chandamale ndi 20% - 30% okha.

  4, Wapakatikati pafupipafupi AC magnetron sputtering

Zimatanthawuza kuti mu zida zapakati pafupipafupi za AC magnetron sputtering, nthawi zambiri mipherezero iwiri yokhala ndi kukula kofanana ndi mawonekedwe amapangidwa mbali ndi mbali, yomwe nthawi zambiri imatchedwa mapasa.Iwo inaimitsidwa makhazikitsidwe.Kawirikawiri, zolinga ziwiri zimayendetsedwa nthawi imodzi.M'kati sing'anga pafupipafupi AC maginito zotakasika sputtering, mipherezero awiri amachita monga anode ndi cathode nayenso, ndipo amachita monga anode cathode wina ndi mzake mu kuzungulira theka lomwelo.Pamene chandamale chiri pa mphamvu yolakwika ya theka la mkombero, chandamalecho chimaponyedwa ndi ma ions abwino;Munthawi yabwino yozungulira, ma elekitironi a plasma amathamangitsidwa kumalo omwe chandamale kuti achepetse chiwongola dzanja chabwino chomwe chimasonkhanitsidwa pamalo otchingidwa ndi chandamale, chomwe sichimangochepetsa kuyatsa kwa malo omwe chandamale, komanso kumachotsa chodabwitsa cha " kusowa kwa anode."

Ubwino wa intermediate frequency double target reactive sputtering ndi:

(1) Mtengo wokwera kwambiri.Pazolinga za silicon, kuchuluka kwa ma sing'anga apakati pafupipafupi zotakataka ndi 10 kuwirikiza kwa DC reactive sputtering;

(2) Njira ya sputtering ikhoza kukhazikika pa malo ogwirira ntchito;

(3) Chodabwitsa cha "kuwotcha" chimathetsedwa.Kachulukidwe kachilema ka filimu yotsekereza yokonzekera ndi yocheperako kuposa njira ya DC reactive sputtering;

(4) Kutentha kwapamwamba kwa gawo lapansi kumapindulitsa kupititsa patsogolo ubwino ndi kumamatira kwa filimuyo;

(5) Ngati magetsi ndi osavuta kufananiza chandamale kuposa magetsi a RF.

  5, Zochita magnetron sputtering

Mu sputtering ndondomeko, anachita mpweya kudyetsedwa anachita ndi sputtered particles kupanga pawiri mafilimu.Ikhoza kupereka mpweya wokhazikika kuti ugwirizane ndi chandamale cha sputtering panthawi imodzimodziyo, komanso ingaperekenso mpweya wokhazikika kuti ugwirizane ndi zitsulo zotayira kapena chandamale cha aloyi pa nthawi yomweyo kukonzekera mafilimu apawiri omwe ali ndi chiŵerengero cha mankhwala.

Ubwino wamakanema apawiri a magnetron sputtering:

(1) Zida zomwe zimagwiritsidwa ntchito ndi mpweya womwe umagwiritsidwa ntchito ndi mpweya, nayitrogeni, ma hydrocarbons, ndi zina zotero, zomwe nthawi zambiri zimakhala zosavuta kupeza zinthu zoyera kwambiri, zomwe zimathandiza kuti pakhale mafilimu oyeretsa kwambiri;

(2) Mwa kusintha magawo a ndondomekoyi, mafilimu opangidwa ndi mankhwala kapena osakhala ndi mankhwala akhoza kukonzedwa, kotero kuti mawonekedwe a mafilimu akhoza kusinthidwa;

(3) Kutentha kwa gawo lapansi sikwapamwamba, ndipo pali zoletsa zochepa pa gawo lapansi;

(4) Ndi oyenera ❖ kuyanika yunifolomu lalikulu ndipo amazindikira kupanga mafakitale.

Mu ndondomeko ya zotakasika magnetron sputtering, kusakhazikika kwa pawiri sputtering n'zosavuta kuchitika, makamaka kuphatikizapo:

(1) Nkovuta kukonzekera mipherezero yambiri;

(2) Chodabwitsa cha arc kugunda (kutulutsa kwa arc) komwe kumachitika chifukwa chakupha chandamale komanso kusakhazikika kwa sputtering;

(3) Low sputtering deposition rate;

(4) Kuchulukana kwachilema kwa filimuyi ndikwambiri.


Nthawi yotumiza: Jul-21-2022